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Progress in qualifying and quantifying the airborne base sensitivity of modern chemically amplified DUV photoresists

dc.contributor.authorKinkead, D. A.
dc.contributor.authorErcken, Monique
dc.date.accessioned2021-10-14T13:08:51Z
dc.date.available2021-10-14T13:08:51Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4471
dc.sourceIIOimport
dc.titleProgress in qualifying and quantifying the airborne base sensitivity of modern chemically amplified DUV photoresists
dc.typeProceedings paper
dc.contributor.imecauthorErcken, Monique
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage750
dc.source.endpage758
dc.source.conferenceAdvances in Resist Technology and Processing XVII
dc.source.conferencedate28/02/2000
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 3999


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