A comparative study of copper drift diffusion in plasma deposited A-Sic:H and silicon nitride
dc.contributor.author | Lanckmans, Filip | |
dc.contributor.author | Gray, William | |
dc.contributor.author | Brijs, Bert | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-10-14T13:13:48Z | |
dc.date.available | 2021-10-14T13:13:48Z | |
dc.date.issued | 2000 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4513 | |
dc.source | IIOimport | |
dc.title | A comparative study of copper drift diffusion in plasma deposited A-Sic:H and silicon nitride | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Maex, Karen | |
dc.source.peerreview | no | |
dc.source.conference | Materials for Advanced Metallization Conference - MAM; February 28 - March 1, 2000; Stresa, Italy. | |
dc.source.conferencelocation | ||
imec.availability | Published - imec |
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