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dc.contributor.authorLauwers, A.
dc.contributor.authorBesser, Paul
dc.contributor.authorGutt, T.
dc.contributor.authorSatta, Alessandra
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorLindsay, Richard
dc.contributor.authorRoelandts, Nico
dc.contributor.authorLoosen, Fred
dc.contributor.authorJin, S.
dc.contributor.authorBender, Hugo
dc.contributor.authorStucchi, Michele
dc.contributor.authorVrancken, Evi
dc.contributor.authorDeweerdt, Bruno
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T13:15:19Z
dc.date.available2021-10-14T13:15:19Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4524
dc.sourceIIOimport
dc.titleComparative study of Ni-silicide and Co-silicide for sub 0.25-μm technologies
dc.typeJournal article
dc.contributor.imecauthorBesser, Paul
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorLoosen, Fred
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorVrancken, Evi
dc.contributor.imecauthorDeweerdt, Bruno
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage103
dc.source.endpage116
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume50
imec.availabilityPublished - imec


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