dc.contributor.author | Lauwers, A. | |
dc.contributor.author | Besser, Paul | |
dc.contributor.author | Gutt, T. | |
dc.contributor.author | Satta, Alessandra | |
dc.contributor.author | de Potter de ten Broeck, Muriel | |
dc.contributor.author | Lindsay, Richard | |
dc.contributor.author | Roelandts, Nico | |
dc.contributor.author | Loosen, Fred | |
dc.contributor.author | Jin, S. | |
dc.contributor.author | Bender, Hugo | |
dc.contributor.author | Stucchi, Michele | |
dc.contributor.author | Vrancken, Evi | |
dc.contributor.author | Deweerdt, Bruno | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-10-14T13:15:19Z | |
dc.date.available | 2021-10-14T13:15:19Z | |
dc.date.issued | 2000 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4524 | |
dc.source | IIOimport | |
dc.title | Comparative study of Ni-silicide and Co-silicide for sub 0.25-μm technologies | |
dc.type | Journal article | |
dc.contributor.imecauthor | Besser, Paul | |
dc.contributor.imecauthor | de Potter de ten Broeck, Muriel | |
dc.contributor.imecauthor | Loosen, Fred | |
dc.contributor.imecauthor | Bender, Hugo | |
dc.contributor.imecauthor | Stucchi, Michele | |
dc.contributor.imecauthor | Vrancken, Evi | |
dc.contributor.imecauthor | Deweerdt, Bruno | |
dc.contributor.imecauthor | Maex, Karen | |
dc.source.peerreview | no | |
dc.source.beginpage | 103 | |
dc.source.endpage | 116 | |
dc.source.journal | Microelectronic Engineering | |
dc.source.issue | 1_4 | |
dc.source.volume | 50 | |
imec.availability | Published - imec | |