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dc.contributor.authorLoewenstein, Lee
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-14T13:17:13Z
dc.date.available2021-10-14T13:17:13Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4539
dc.sourceIIOimport
dc.titleCompetititive adsorption of cations onto the silicon surface: the role of the ammonium ion in ammonia-peroxide solution
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage512
dc.source.endpage19
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing. Proceedings of the 6th International Symposium
dc.source.conferencedate17/10/1999
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. PV 99-36


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