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Simulation of 0.35μm/0.25μm CMOS technology doping profiles

dc.contributor.authorLorenzini, Martino
dc.contributor.authorHaspeslagh, Luc
dc.contributor.authorVan Houdt, Jan
dc.contributor.authorMaes, Herman
dc.date.accessioned2021-10-14T13:17:29Z
dc.date.available2021-10-14T13:17:29Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4541
dc.sourceIIOimport
dc.titleSimulation of 0.35μm/0.25μm CMOS technology doping profiles
dc.typeProceedings paper
dc.contributor.imecauthorHaspeslagh, Luc
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.contributor.orcidimecHaspeslagh, Luc::0000-0003-3561-3387
dc.source.peerreviewno
dc.source.beginpage167
dc.source.endpage168
dc.source.conference7th International Workshop on Computational Electronics. Book of Abstracts. IWCE; May 2000; Glasgow, Scotland.
dc.source.conferencelocation
imec.availabilityPublished - imec


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