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Impact of cobalt silicidation on the low-frequency noise behavior of shallow P-N junctions

dc.contributor.authorLukyanchikova, N. B.
dc.contributor.authorPetrichuk, M. V.
dc.contributor.authorGarbar, N.
dc.contributor.authorSimoen, Eddy
dc.contributor.authorPoyai, Amporn
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-10-14T13:17:45Z
dc.date.available2021-10-14T13:17:45Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4543
dc.sourceIIOimport
dc.titleImpact of cobalt silicidation on the low-frequency noise behavior of shallow P-N junctions
dc.typeJournal article
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage408
dc.source.endpage410
dc.source.journalIEEE Electron Device Letters
dc.source.issue8
dc.source.volume21
imec.availabilityPublished - open access


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