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Limits of optical lithography

dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorRonse, Kurt
dc.contributor.authorZandbergen, Peter
dc.contributor.authorMuzio, E.
dc.date.accessioned2021-10-14T13:18:15Z
dc.date.available2021-10-14T13:18:15Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4547
dc.sourceIIOimport
dc.titleLimits of optical lithography
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage373
dc.source.endpage387
dc.source.conferenceOptical Microlithography XIII
dc.source.conferencedate1/03/2000
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 4000


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