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Silicides for 0.13 μm technologies and beyond

dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T13:18:37Z
dc.date.available2021-10-14T13:18:37Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4550
dc.sourceIIOimport
dc.titleSilicides for 0.13 μm technologies and beyond
dc.typeOral presentation
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.conferenceMRS Spring Meeting 2000. Symposium C: Gate Stack and Silicide Issues in Silicon Processing; 24-28 April 2000; San Francisco, Ca,
dc.source.conferencelocation
imec.availabilityPublished - imec


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