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Measurement technique, oxide thickness and area dependence of soft breakdown

dc.contributor.authorNigam, Tanya
dc.contributor.authorDegraeve, Robin
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorHeyns, Marc
dc.contributor.authorMaes, Herman
dc.date.accessioned2021-10-14T13:28:34Z
dc.date.available2021-10-14T13:28:34Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4623
dc.sourceIIOimport
dc.titleMeasurement technique, oxide thickness and area dependence of soft breakdown
dc.typeProceedings paper
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorHeyns, Marc
dc.source.peerreviewno
dc.source.beginpage337
dc.source.endpage343
dc.source.conferenceStructural and Electronic Properties of Ultrathin Dielectrics on Silicon and Related Structures; November 1999; Boston, MA, USA.
dc.source.conferencelocation
imec.availabilityPublished - imec


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