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Stress Relaxation in Al-Si-Cu Thin Films and Lines

dc.contributor.authorWitvrouw, Ann
dc.contributor.authorProost, Joris
dc.contributor.authorDeweerdt, Bruno
dc.contributor.authorRoussel, Philippe
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-29T12:53:33Z
dc.date.available2021-09-29T12:53:33Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/463
dc.sourceIIOimport
dc.titleStress Relaxation in Al-Si-Cu Thin Films and Lines
dc.typeOral presentation
dc.contributor.imecauthorDeweerdt, Bruno
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.conferenceMRS Fall Meeting : Symposium on Thin Films : Stresses and Mechanical Properties V; November 28 - December 2, 1994; Boston, Mass.
imec.availabilityPublished - imec


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