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Dual damascene back-end patterning using 248nm and 193nm lithography

dc.contributor.authorPollentier, Ivan
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVangoidsenhoven, Diziana
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-14T13:34:48Z
dc.date.available2021-10-14T13:34:48Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4665
dc.sourceIIOimport
dc.titleDual damascene back-end patterning using 248nm and 193nm lithography
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage265
dc.source.endpage283
dc.source.conferenceProceedings Interface - Arch Microlithography Symposium
dc.source.conferencedate5/11/2000
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - open access


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