Show simple item record

Measurement and simulation of boron diffusion in strained Si1-xGex epitaxial layers with linearly graded germanium profile

dc.contributor.authorKrishnasamy, Rajendran
dc.contributor.authorSchoenmaker, Wim
dc.date.accessioned2021-10-14T13:37:38Z
dc.date.available2021-10-14T13:37:38Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4684
dc.sourceIIOimport
dc.titleMeasurement and simulation of boron diffusion in strained Si1-xGex epitaxial layers with linearly graded germanium profile
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.conferenceProceedings of ICCCD
dc.source.conferencedate15/12/2000
dc.source.conferencelocationkaragpur India
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record