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ArF lithography for the 130 and 100nm technology nodes

dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-14T13:40:51Z
dc.date.available2021-10-14T13:40:51Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4706
dc.sourceIIOimport
dc.titleArF lithography for the 130 and 100nm technology nodes
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage6
dc.source.endpage7
dc.source.conferenceInternational Microprocess and Nanotechnology Conference - MNC
dc.source.conferencedate11/07/2000
dc.source.conferencelocationTokyo Japan
imec.availabilityPublished - open access


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