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Reticle status and issues for application in advanced 193 nm lithography

dc.contributor.authorRonse, Kurt
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-14T13:40:59Z
dc.date.available2021-10-14T13:40:59Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4707
dc.sourceIIOimport
dc.titleReticle status and issues for application in advanced 193 nm lithography
dc.typeOral presentation
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.conferenceEuropean Mask Conference; 13-14 November 2000; Munich, Germany.
dc.source.conferencelocation
imec.availabilityPublished - imec


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