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Lithography as a critical step for low-k dual damascene: from 248nm to 193nm

dc.contributor.authorRonse, Kurt
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorPollentier, Ivan
dc.contributor.authorWiaux, Vincent
dc.contributor.authorStruyf, Herbert
dc.contributor.authorLepage, Muriel
dc.contributor.authorVanhaelemeersch, Serge
dc.date.accessioned2021-10-14T13:41:09Z
dc.date.available2021-10-14T13:41:09Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4708
dc.sourceIIOimport
dc.titleLithography as a critical step for low-k dual damascene: from 248nm to 193nm
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage87
dc.source.endpage90
dc.source.conferenceInternational Interconnect Technology Conference - IITC
dc.source.conferencedate5/06/2000
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access


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