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Evaluating probes for "electrical" atomic force microscopy

dc.contributor.authorTrenkler, Thomas
dc.contributor.authorHantschel, Thomas
dc.contributor.authorStephenson, Robert
dc.contributor.authorDe Wolf, Peter
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHellemans, L.
dc.contributor.authorMalavé, A.
dc.contributor.authorBüchel, D.
dc.contributor.authorOesterschulze, E.
dc.contributor.authorKulisch, W.
dc.contributor.authorNiedermann, P.
dc.contributor.authorSulzbach, T.
dc.contributor.authorOhlsson, O.
dc.date.accessioned2021-10-14T13:55:12Z
dc.date.available2021-10-14T13:55:12Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4798
dc.sourceIIOimport
dc.titleEvaluating probes for "electrical" atomic force microscopy
dc.typeJournal article
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage418
dc.source.endpage427
dc.source.journalJ. Vacuum Science and Technology B
dc.source.issue1
dc.source.volumeB18
imec.availabilityPublished - open access
imec.internalnotesPapers from the 5th International Workshop on the Measurement and Characterization of Ultra-Shallow Doping Profiles; 1999


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