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Aspects of metal etching for interconnect technologies

dc.contributor.authorVerdonck, P.
dc.contributor.authorMeynen, Herman
dc.date.accessioned2021-09-29T12:54:54Z
dc.date.available2021-09-29T12:54:54Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/486
dc.sourceIIOimport
dc.titleAspects of metal etching for interconnect technologies
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference3rd Brazilian Microelectronics School: Advanced Metallization for VLSI/ULSI Applications
dc.source.conferencedate16/05/1994
dc.source.conferencelocationCampinas Brazil
imec.availabilityPublished - open access
imec.internalnotesunpaged proceedings


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