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dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorEyben, Pierre
dc.contributor.authorCallewaert, Sven
dc.contributor.authorHantschel, Thomas
dc.contributor.authorDuhayon, Natasja
dc.contributor.authorXu, Mingwei
dc.contributor.authorTrenkler, Thomas
dc.contributor.authorClarysse, Trudo
dc.date.accessioned2021-10-14T14:08:55Z
dc.date.available2021-10-14T14:08:55Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4882
dc.sourceIIOimport
dc.titleTowards routine, quantitative two-dimensional carrier profiling with Scanning Spreading Resistance Microscopy
dc.typeOral presentation
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorDuhayon, Natasja
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.source.peerreviewno
dc.source.conferenceInternational Workshop on Metrology for ULSI ; 2000; NIST.
dc.source.conferencelocation
imec.availabilityPublished - imec


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