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Wafer thermal desorption spectrometry in a rapid thermal processor using atmospheric pressure ionization mass spectrometry

dc.contributor.authorVereecke, Guy
dc.contributor.authorKondoh, Eiichi
dc.contributor.authorRichardson, Paul
dc.contributor.authorMaex, Karen
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T14:13:17Z
dc.date.available2021-10-14T14:13:17Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4907
dc.sourceIIOimport
dc.titleWafer thermal desorption spectrometry in a rapid thermal processor using atmospheric pressure ionization mass spectrometry
dc.typeJournal article
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage315
dc.source.endpage321
dc.source.journalIEEE Trans. Semiconductor Processing
dc.source.issue3
dc.source.volume13
imec.availabilityPublished - open access


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