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Articles
Wafer thermal desorption spectrometry in a rapid thermal processor using atmospheric pressure ionization mass spectrometry
Publication:
Wafer thermal desorption spectrometry in a rapid thermal processor using atmospheric pressure ionization mass spectrometry
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Date
2000
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vereecke, Guy
;
Kondoh, Eiichi
;
Richardson, Paul
;
Maex, Karen
;
Heyns, Marc
Journal
IEEE Trans. Semiconductor Processing
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1992
since deposited on 2021-10-14
1
last month
Acq. date: 2026-01-10
Citations
Metrics
Views
1992
since deposited on 2021-10-14
1
last month
Acq. date: 2026-01-10
Citations