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Hydrogen passivation of HF-last cleaned (100) silicon surfaces: a MIR-FTIR study

dc.contributor.authorBender, Hugo
dc.contributor.authorVerhaverbeke, Steven
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-29T12:55:22Z
dc.date.available2021-09-29T12:55:22Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/493
dc.sourceIIOimport
dc.titleHydrogen passivation of HF-last cleaned (100) silicon surfaces: a MIR-FTIR study
dc.typeProceedings paper
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage186
dc.source.endpage194
dc.source.conferenceProceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate15/10/1993
dc.source.conferencelocationNew Orleans, LA USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 94-7


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