Authors

Rotondaro, Antonio; Meuris, Marc; Schmidt, Harald; Heyns, Marc; Vandervorst, Wilfried; Claeys, Cor; Hellemans, L.; Snauwert, L.

Conference

Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

Title

A semi-quantitative method for studying photoresist stripping

Publication type

Proceedings paper

Embargo date

9999-12-31