Robust and environmentally stable deep UV positive resist: optimization of SUCCESS ST2

Thumbnail
View/open
Metadata
Show full item record
Authors
Schwalm, R.; Binder, H.; Fischer, T.; Funhoff, D.; Goethals, Mieke; Grassmann, A.; Moritz, H.; Paniez, P.; Reuhman-Huisken, M.; Vinet, F.; Dijkstra, H.; Krause, A.
Conference
Advances in Resist Technology and Processing XI
Title
Robust and environmentally stable deep UV positive resist: optimization of SUCCESS ST2
Publication type
Proceedings paper
Embargo date
9999-12-31
Collections