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SiON ARC: Material characterization and implication in lithographic process

dc.contributor.authorZhang, Fenghong
dc.contributor.authorPollentier, Ivan
dc.contributor.authorEliat, Astrid
dc.contributor.authorDelvaux, Christie
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-14T14:24:08Z
dc.date.available2021-10-14T14:24:08Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4969
dc.sourceIIOimport
dc.titleSiON ARC: Material characterization and implication in lithographic process
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage191
dc.source.endpage200
dc.source.conferenceProceedings Interface - Arch Microlithography Symposium
dc.source.conferencedate5/11/2000
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - open access


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