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dc.contributor.authorZhang, J.F.
dc.contributor.authorSii, H. K.
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorDegraeve, Robin
dc.date.accessioned2021-10-14T14:24:28Z
dc.date.available2021-10-14T14:24:28Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4971
dc.sourceIIOimport
dc.titleDegradation of oxides and oxynitrides under hot hole stress
dc.typeJournal article
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorDegraeve, Robin
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage378
dc.source.endpage386
dc.source.journalIEEE Trans. Electron Devices
dc.source.issue2
dc.source.volume47
imec.availabilityPublished - open access


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