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Hydrogen induced and plasma charging enhanced positive charge generation in gate oxides

dc.contributor.authorZhao, C.Z.
dc.contributor.authorZhang, J.F.
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorDegraeve, Robin
dc.contributor.authorEllis, J. N.
dc.contributor.authorBeech, C. D.
dc.date.accessioned2021-10-14T14:24:50Z
dc.date.available2021-10-14T14:24:50Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4973
dc.sourceIIOimport
dc.titleHydrogen induced and plasma charging enhanced positive charge generation in gate oxides
dc.typeProceedings paper
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorDegraeve, Robin
dc.source.peerreviewno
dc.source.beginpage129
dc.source.endpage132
dc.source.conference5th International Symposium on Plasma Process-Induced Damage
dc.source.conferencedate23/05/2000
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec


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