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Characterization of low-k dielectric films by ellipsometric porosimetry

dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMogilnikov, K. P.
dc.date.accessioned2021-10-14T16:36:39Z
dc.date.available2021-10-14T16:36:39Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5036
dc.sourceIIOimport
dc.titleCharacterization of low-k dielectric films by ellipsometric porosimetry
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.beginpageD4.2.1
dc.source.endpageD4.2.12
dc.source.conferenceMaterials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics
dc.source.conferencedate23/04/2000
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMaterials Research Society Symposium Proceedings; Vol. 612


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