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Non-destructive characterisation of porosity and pore size distribution in porous low-k dielectric films

dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMogilnikov, K. P.
dc.date.accessioned2021-10-14T16:36:40Z
dc.date.available2021-10-14T16:36:40Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5037
dc.sourceIIOimport
dc.titleNon-destructive characterisation of porosity and pore size distribution in porous low-k dielectric films
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.beginpage352
dc.source.endpage357
dc.source.conferenceICSICT - 6th International Conference on Solid-State Integrated Circuit Technology. Proceedings
dc.source.conferencedate22/10/2001
dc.source.conferencelocationShanghai China
imec.availabilityPublished - imec


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