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Pre-diffusion cleaning using ozone and HF

dc.contributor.authorBergman, E. J.
dc.contributor.authorLagrange, Sébastien
dc.contributor.authorClaes, Martine
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorRöhr, Erika
dc.date.accessioned2021-10-14T16:37:14Z
dc.date.available2021-10-14T16:37:14Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5056
dc.sourceIIOimport
dc.titlePre-diffusion cleaning using ozone and HF
dc.typeProceedings paper
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage85
dc.source.endpage88
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS
dc.source.conferencedate18/09/2000
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena. Part B; Vol. 76-77


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