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SOI photonic crystal fabrication using deep UV lithography

dc.contributor.authorBogaerts, Wim
dc.contributor.authorTaillaert, Dirk
dc.contributor.authorBaets, Roel
dc.contributor.authorWiaux, Vincent
dc.contributor.authorBeckx, Stephan
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-14T16:38:16Z
dc.date.available2021-10-14T16:38:16Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5082
dc.sourceIIOimport
dc.titleSOI photonic crystal fabrication using deep UV lithography
dc.typeProceedings paper
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorBaets, Roel
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.contributor.orcidimecBaets, Roel::0000-0003-1266-1319
dc.source.peerreviewno
dc.source.conference3rd Workshop on Photonic and Electromagnetic Crystal Structures (PECS 3)
dc.source.conferencedate9/06/2001
dc.source.conferencelocationSt. Andrews UK
imec.availabilityPublished - imec


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