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Controlled deposition of organic contamination and removal with ozone-based cleaning

dc.contributor.authorClaes, M.
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorKenens, Conny
dc.contributor.authorConard, Thierry
dc.contributor.authorBender, Hugo
dc.contributor.authorStorm, Wolfgang
dc.contributor.authorBauer, T.
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T16:41:51Z
dc.date.available2021-10-14T16:41:51Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5143
dc.sourceIIOimport
dc.titleControlled deposition of organic contamination and removal with ozone-based cleaning
dc.typeJournal article
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.source.peerreviewno
dc.source.beginpageG118
dc.source.endpage125
dc.source.journalJournal of the Electrochemical Society
dc.source.issue3
dc.source.volume148
imec.availabilityPublished - imec


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