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Surface characterization after different wet chemical cleans

dc.contributor.authorClaes, Martine
dc.contributor.authorRöhr, Erika
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Smedt, Frank
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorStorm, Wolfgang
dc.contributor.authorBauer, T.
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T16:41:56Z
dc.date.available2021-10-14T16:41:56Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5144
dc.sourceIIOimport
dc.titleSurface characterization after different wet chemical cleans
dc.typeProceedings paper
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage67
dc.source.endpage70
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS
dc.source.conferencedate18/09/2000
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena. Part B; Vol. 76-77


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