dc.contributor.author | Claes, M. | |
dc.contributor.author | Röhr, Erika | |
dc.contributor.author | De Gendt, Stefan | |
dc.contributor.author | Heyns, Marc | |
dc.contributor.author | Lagrange, Sébastien | |
dc.contributor.author | Bergman, E. | |
dc.date.accessioned | 2021-10-14T16:42:00Z | |
dc.date.available | 2021-10-14T16:42:00Z | |
dc.date.issued | 2001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5145 | |
dc.source | IIOimport | |
dc.title | Ozonated HF applications in a spray processing tool | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.source.peerreview | no | |
dc.source.conference | 200th Meeting of the Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device Manufac | |
dc.source.conferencedate | 2/09/2001 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - imec | |
imec.internalnotes | Abstract 1413 | |