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Towards Sub-10 nm carrier profiling with spreading resistance techniques

dc.contributor.authorClarysse, Trudo
dc.contributor.authorEyben, Pierre
dc.contributor.authorHantschel, Thomas
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-14T16:42:22Z
dc.date.available2021-10-14T16:42:22Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5150
dc.sourceIIOimport
dc.titleTowards Sub-10 nm carrier profiling with spreading resistance techniques
dc.typeJournal article
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.source.peerreviewno
dc.source.beginpage61
dc.source.endpage66
dc.source.journalMaterials Science in Semiconductor Processing
dc.source.issue1_3
dc.source.volume4
imec.availabilityPublished - imec


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