Show simple item record

Formation of epitaxial CoSi2 by a Cr or Mo interlayer: comparison with a Ti interlayer

dc.contributor.authorDetavernier, C.
dc.contributor.authorVan Meirhaeghe, R. L.
dc.contributor.authorCardon, F.
dc.contributor.authorMaex, Karen
dc.contributor.authorBender, Hugo
dc.contributor.authorBrijs, Bert
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-14T16:51:05Z
dc.date.available2021-10-14T16:51:05Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5249
dc.sourceIIOimport
dc.titleFormation of epitaxial CoSi2 by a Cr or Mo interlayer: comparison with a Ti interlayer
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.beginpage2146
dc.source.endpage2150
dc.source.journalJournal of Applied Physics
dc.source.issue4
dc.source.volume89
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record