dc.contributor.author | Fyen, Wim | |
dc.contributor.author | Holsteyns, Frank | |
dc.contributor.author | Mertens, Paul | |
dc.contributor.author | Lauerhaas, Jeff | |
dc.contributor.author | Heyns, Marc | |
dc.date.accessioned | 2021-10-14T16:57:04Z | |
dc.date.available | 2021-10-14T16:57:04Z | |
dc.date.issued | 2001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5303 | |
dc.source | IIOimport | |
dc.title | Estimation of evaporating water film thickness during different drying processes | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Holsteyns, Frank | |
dc.contributor.imecauthor | Mertens, Paul | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.source.peerreview | no | |
dc.source.conference | 200th Meeting of the Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device Manufac | |
dc.source.conferencedate | 2/09/2001 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - imec | |
imec.internalnotes | Abstract 1437 | |