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Polarity dependence of defect generation in ultrathin SiO2/ZrO2 gate dielectric stacks

dc.contributor.authorHoussa, Michel
dc.contributor.authorAfanas'ev, V. V.
dc.contributor.authorStesmans, Andre
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T17:02:54Z
dc.date.available2021-10-14T17:02:54Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5349
dc.sourceIIOimport
dc.titlePolarity dependence of defect generation in ultrathin SiO2/ZrO2 gate dielectric stacks
dc.typeJournal article
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorStesmans, Andre
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.source.peerreviewno
dc.source.beginpage3134
dc.source.endpage3136
dc.source.journalApplied Physics Letters
dc.source.issue19
dc.source.volume79
imec.availabilityPublished - imec


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