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Charge trapping in SiOx/ZrO2 and SiOx/TiO2 gate dielectric stacks

dc.contributor.authorHoussa, Michel
dc.contributor.authorNaili, Mohamed
dc.contributor.authorHeyns, Marc
dc.contributor.authorStesmans, Andre
dc.date.accessioned2021-10-14T17:03:09Z
dc.date.available2021-10-14T17:03:09Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5351
dc.sourceIIOimport
dc.titleCharge trapping in SiOx/ZrO2 and SiOx/TiO2 gate dielectric stacks
dc.typeJournal article
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorStesmans, Andre
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.source.peerreviewno
dc.source.beginpage2804
dc.source.endpage2809
dc.source.journalJapanese Journal of Applied Physics Part 1-Regular Papers Short Notes & Review Papers
dc.source.issue4B
dc.source.volume40
imec.availabilityPublished - imec


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