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ArF lithography with combination of moderate OAI and attenuated PSM

dc.contributor.authorKim, Young-Chang
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-14T17:09:18Z
dc.date.available2021-10-14T17:09:18Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5398
dc.sourceIIOimport
dc.titleArF lithography with combination of moderate OAI and attenuated PSM
dc.typeOral presentation
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.conference21st Annual BACUS Symposium on Photomask Technology; October 2001; Monterey, CA, USA.
dc.source.conferencelocation
imec.availabilityPublished - imec


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