Vapor phase deposited total X-ray fluorescence as a means to study copper drift diffusion in low-k dielectrics

dc.contributor.author	Lanckmans, Filip
dc.contributor.author	Arnauts, Sophia
dc.contributor.author	Maex, Karen
dc.date.accessioned	2021-10-14T17:13:00Z
dc.date.available	2021-10-14T17:13:00Z
dc.date.issued	2001
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/5426
dc.source	IIOimport
dc.title	Vapor phase deposited total X-ray fluorescence as a means to study copper drift diffusion in low-k dielectrics
dc.type	Oral presentation
dc.contributor.imecauthor	Arnauts, Sophia
dc.contributor.imecauthor	Maex, Karen
dc.date.embargo	9999-12-31
dc.source.peerreview	no
dc.source.conference	MRS Spring Meeting. Symposium L: Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics; April
dc.source.conferencelocation
imec.availability	Published - open access