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Optimization of etching and stripping chemistries for Z3MS TM low-k

dc.contributor.authorLepage, Muriel
dc.contributor.authorShamiryan, Denis
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorStruyf, Herbert
dc.contributor.authorMannaert, Geert
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorWeidner, Ken
dc.contributor.authorMeynen, Herman
dc.date.accessioned2021-10-14T17:15:22Z
dc.date.available2021-10-14T17:15:22Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5442
dc.sourceIIOimport
dc.titleOptimization of etching and stripping chemistries for Z3MS TM low-k
dc.typeProceedings paper
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.beginpage174
dc.source.endpage176
dc.source.conferenceProceedings of the IEEE 2001 International Interconnect Technology Conference ; 4-6 June 2001; Burlingame, CA, USA.
dc.source.conferencelocation
imec.availabilityPublished - imec


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