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Optimized thermal processing for Ti-Capped CoSi2 for 0.13 μm technology
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Authors
Lindsay, Richard
;
Lauwers, A.
;
de Potter de ten Broeck, Muriel
;
Roelandts, Nico
;
Vrancken, Christa
;
Maex, Karen
Issue
1_4
Journal
Microelectronic Engineering
Volume
55
Title
Optimized thermal processing for Ti-Capped CoSi2 for 0.13 μm technology
Publication type
Journal article
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