The effect of ion implantation on the metal contamination of silicon surfaces in aqueous solution

dc.contributor.author	Loewenstein, Lee
dc.contributor.author	Mertens, Paul
dc.contributor.author	Heyns, Marc
dc.date.accessioned	2021-10-14T17:16:37Z
dc.date.available	2021-10-14T17:16:37Z
dc.date.issued	2001
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/5451
dc.source	IIOimport
dc.title	The effect of ion implantation on the metal contamination of silicon surfaces in aqueous solution
dc.type	Proceedings paper
dc.contributor.imecauthor	Mertens, Paul
dc.contributor.imecauthor	Heyns, Marc
dc.date.embargo	9999-12-31
dc.source.peerreview	no
dc.source.beginpage	7
dc.source.endpage	8
dc.source.conference	Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS
dc.source.conferencedate	18/09/2000
dc.source.conferencelocation	Oostende Belgium
imec.availability	Published - open access
imec.internalnotes	Solid State Phenomena. Part B; Vol. 76-77