dc.contributor.author | Loo, Roger | |
dc.contributor.author | Caymax, Matty | |
dc.contributor.author | Blavier, G. | |
dc.contributor.author | Kremer, Stephanie | |
dc.date.accessioned | 2021-10-14T17:16:45Z | |
dc.date.available | 2021-10-14T17:16:45Z | |
dc.date.issued | 2001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5452 | |
dc.source | IIOimport | |
dc.title | In-line and nondestructive analysis of selectively grown epitaxial Si1-xGex and Si/Si1-xGex layers by spectroscopic ellipsometry and comparison with other established techniques | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Loo, Roger | |
dc.contributor.imecauthor | Caymax, Matty | |
dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
dc.source.peerreview | no | |
dc.source.conference | In-Line Characterization, Yield, Reliability, and Failure Analysis in Microelectronic Manufacturing II; 1 June 2001; Edinburgh, | |
dc.source.conferencelocation | | |
imec.availability | Published - imec | |