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Model based OPC for 1st generation 193-nm lithography
Publication:
Model based OPC for 1st generation 193-nm lithography
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Date
2001
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lucas, Kevin
;
Word, James
;
Vandenberghe, Geert
;
Verhaegen, Staf
;
Jonckheere, Rik
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1848
since deposited on 2021-10-14
Acq. date: 2025-12-11
Citations
Metrics
Views
1848
since deposited on 2021-10-14
Acq. date: 2025-12-11
Citations