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Model based OPC for 1st generation 193-nm lithography
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Authors
Lucas, Kevin
;
Word, James
;
Vandenberghe, Geert
;
Verhaegen, Staf
;
Jonckheere, Rik
Conference
Optical Microlithography XIV
Title
Model based OPC for 1st generation 193-nm lithography
Publication type
Proceedings paper
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