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Lithography aspects of dual damascene interconnect technology

dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVangoidsenhoven, Diziana
dc.contributor.authorPollentier, Ivan
dc.contributor.authorRonse, Kurt
dc.contributor.authorLepage, Muriel
dc.contributor.authorStruyf, Herbert
dc.contributor.authorVan Hove, Marleen
dc.date.accessioned2021-10-14T17:18:23Z
dc.date.available2021-10-14T17:18:23Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5463
dc.sourceIIOimport
dc.titleLithography aspects of dual damascene interconnect technology
dc.typeProceedings paper
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1
dc.source.endpage14
dc.source.conferenceLithography for Semiconductor Manufacturing II
dc.source.conferencedate30/05/2001
dc.source.conferencelocationEdinburgh UK
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 4404


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