Show simple item record

Optimization of reactive ion etching of Al0.48In0.52As in CH4/H2 by the experimental design method

dc.contributor.authorCarpi, Enio
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorAlay, Josep Lluis
dc.contributor.authorVan Rossum, Marc
dc.date.accessioned2021-09-29T13:04:26Z
dc.date.available2021-09-29T13:04:26Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/546
dc.sourceIIOimport
dc.titleOptimization of reactive ion etching of Al0.48In0.52As in CH4/H2 by the experimental design method
dc.typeJournal article
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage895
dc.source.endpage901
dc.source.journalJ. Vac. Sci. Technol. B
dc.source.issue3
dc.source.volume13
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
517.pdf
Size:
253.5Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record