dc.contributor.author | Mertens, Paul | |
dc.contributor.author | Vos, Rita | |
dc.contributor.author | Bearda, Twan | |
dc.contributor.author | Maes, Marjan | |
dc.contributor.author | Lauerhaas, Jeff | |
dc.contributor.author | Loewenstein, Lee | |
dc.contributor.author | Fyen, Wim | |
dc.contributor.author | Holsteyns, Frank | |
dc.contributor.author | Kenis, Karine | |
dc.contributor.author | Xu, Kaidong | |
dc.contributor.author | Teerlinck, Ivo | |
dc.contributor.author | Arnauts, Sophia | |
dc.contributor.author | Schmidt, Michael | |
dc.contributor.author | Heyns, Marc | |
dc.date.accessioned | 2021-10-14T17:20:03Z | |
dc.date.available | 2021-10-14T17:20:03Z | |
dc.date.issued | 2001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5474 | |
dc.source | IIOimport | |
dc.title | Recent advances in wafer cleaning | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Mertens, Paul | |
dc.contributor.imecauthor | Vos, Rita | |
dc.contributor.imecauthor | Holsteyns, Frank | |
dc.contributor.imecauthor | Kenis, Karine | |
dc.contributor.imecauthor | Arnauts, Sophia | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.orcidimec | Vos, Rita::0000-0003-2610-3406 | |
dc.source.peerreview | no | |
dc.source.conference | Proceedings SEMI Front End Technology Conference | |
dc.source.conferencedate | 24/04/2001 | |
dc.source.conferencelocation | München Germany | |
imec.availability | Published - imec | |