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Recent advances in wafer cleaning

dc.contributor.authorMertens, Paul
dc.contributor.authorVos, Rita
dc.contributor.authorBearda, Twan
dc.contributor.authorMaes, Marjan
dc.contributor.authorLauerhaas, Jeff
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorFyen, Wim
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorKenis, Karine
dc.contributor.authorXu, Kaidong
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorArnauts, Sophia
dc.contributor.authorSchmidt, Michael
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T17:20:03Z
dc.date.available2021-10-14T17:20:03Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5474
dc.sourceIIOimport
dc.titleRecent advances in wafer cleaning
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVos, Rita::0000-0003-2610-3406
dc.source.peerreviewno
dc.source.conferenceProceedings SEMI Front End Technology Conference
dc.source.conferencedate24/04/2001
dc.source.conferencelocationMünchen Germany
imec.availabilityPublished - imec


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