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SPM characterizaton of anomalies in phase shift mask and their effect on wafer features

dc.contributor.authorMuckenhirn, S.
dc.contributor.authorMeyyappan, A.
dc.contributor.authorWalch, K.
dc.contributor.authorMaslow, M.
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorvan Wingerden, Johannes
dc.date.accessioned2021-10-14T17:23:45Z
dc.date.available2021-10-14T17:23:45Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5499
dc.sourceIIOimport
dc.titleSPM characterizaton of anomalies in phase shift mask and their effect on wafer features
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage188
dc.source.endpage199
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XV
dc.source.conferencedate26/02/2001
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 4344


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