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Advanced single chemistry alkaline cleaning in a STEAG single tank tool

dc.contributor.authorOnsia, Bart
dc.contributor.authorSchellkes, E.
dc.contributor.authorVos, Rita
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDoll, O.
dc.contributor.authorFester, A.
dc.contributor.authorKolbesen, B. O.
dc.contributor.authorHoffman, M.
dc.contributor.authorHatcher, Z.
dc.contributor.authorWolke, K.
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T17:32:19Z
dc.date.available2021-10-14T17:32:19Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5553
dc.sourceIIOimport
dc.titleAdvanced single chemistry alkaline cleaning in a STEAG single tank tool
dc.typeMeeting abstract
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conference200th Meeting of the Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device Manufac
dc.source.conferencedate2/09/2001
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec


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